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Results of ion implantation into silicon in the 100 MeV Range: I: Oxygen and boron implantation

✍ Scribed by Fahrner, W. R. ;Heidemann, K. ;Schöttle, P.


Publisher
John Wiley and Sons
Year
1982
Tongue
English
Weight
549 KB
Volume
70
Category
Article
ISSN
0031-8965

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