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Removal of SU-8 photoresist for thick film applications

✍ Scribed by Paul M. Dentinger; W.Miles Clift; Steven H. Goods


Book ID
114155424
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
152 KB
Volume
61-62
Category
Article
ISSN
0167-9317

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SU-8 nanocomposite photoresist with low
✍ SΓ©bastien Jiguet; Arnaud Bertsch; Moshe Judelewicz; Heinrich Hofmann; Philippe R πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 231 KB

A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nanosilica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structure