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A new fabrication process for uniform SU-8 thick photoresist structures by simultaneously removing edge bead and air bubbles

✍ Scribed by Lee, Hun; Lee, Kangsun; Ahn, Byungwook; Xu, Jing; Xu, Linfeng; Oh, Kwang W


Book ID
120385049
Publisher
Institute of Physics
Year
2011
Tongue
English
Weight
899 KB
Volume
21
Category
Article
ISSN
0960-1317

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