✦ LIBER ✦
SU-8 nanocomposite photoresist with low stress properties for microfabrication applications
✍ Scribed by Sébastien Jiguet; Arnaud Bertsch; Moshe Judelewicz; Heinrich Hofmann; Philippe Renaud
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 231 KB
- Volume
- 83
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
✦ Synopsis
A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nanosilica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structures show low stress and less cracks than pure SU-8 structures. No significant resolution difference has been observed for both materials.