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Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier

✍ Scribed by Ju-Young Yun; Shi-Woo Rhee

Book ID: 110642287
Publisher: Springer US
Year: 1996
Tongue: English
Weight: 683 KB
Volume: 13
Category: Article
ISSN: 0256-1115
DOI: 10.1007/bf02706002

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