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Effect of H2 and N2 in the remote plasma enhanced metal organic chemical vapor deposition of TiN from tetrakis-diethyl-amido-titanium

✍ Scribed by Ju-Young Yun; Shi-Woo Rhee

Book ID
108389219
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
292 KB
Volume
312
Category
Article
ISSN
0040-6090

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