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Remote microwave plasma-enhanced chemical vapor deposition of amorphous carbon on silicon and titanium alloy substrates

✍ Scribed by C. Tixier; P. Tristant; J. Desmaison; R. Ranc

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 471 KB
Volume: 80
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(95)02699-1

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