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Relationship between the growth rate and Al incorporation of AlGaN by metalorganic chemical vapor deposition

✍ Scribed by Y. Deng; D.G. Zhao; L.C. Le; D.S. Jiang; L.L. Wu; J.J. Zhu; H. Wang; Z.S. Liu; S.M. Zhang; Hui Yang; J.W. Liang

Book ID: 116607525
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 311 KB
Volume: 509
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2010.09.057

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