✦ LIBER ✦

Growth and characterization of Al2O3 gate dielectric films by low-pressure metalorganic chemical vapor deposition

✍ Scribed by Qi-Yue Shao; Ai-Dong Li; Hui-Qin Ling; Di Wu; Yuan Wang; Yan Feng; Sen-Zu Yang; Zhi-Guo Liu; Mu Wang; Nai-Ben Ming

No coin nor oath required. For personal study only.

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