Reflective mask for projection lithography operating at a wavelength of 13.5 nm

✍ Scribed by Gusev, S. A.; Zuev, S. Yu.; Klimov, A. Yu.; Pestov, A. E.; Polkovnikov, V. N.; Rogov, V. V.; Salashchenko, N. N.; Skorokhodov, E. V.; Toropov, M. N.; Chkhalo, N. I.

• Book ID: 119883625
• Publisher: Pleiades Publishing
• Year: 2012
• Tongue: English
• Weight: 665 KB
• Volume: 6
• Category: Article
• ISSN: 1027-4510
• DOI: 10.1134/s1027451012070075