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Two-mirror projection objective of a nanolithographer at λ = 13.5 nm

✍ Scribed by S. Yu. Zuev; A. E. Pestov; N. N. Salashchenko; A. S. Skryl; I. L. Stroulea; L. A. Suslov; M. N. Toropov; N. I. Chkhalo

Book ID: 111502105
Publisher: Allerton Press Inc
Year: 2011
Tongue: English
Weight: 717 KB
Volume: 75
Category: Article
ISSN: 1062-8738
DOI: 10.3103/s1062873811010308

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