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Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

✍ Scribed by Klosner, M. A.; Bender, H. A.; Silfvast, W. T.; Rocca, J. J.

Book ID: 115422229
Publisher: Optical Society of America
Year: 1997
Tongue: English
Weight: 241 KB
Volume: 22
Category: Article
ISSN: 0146-9592
DOI: 10.1364/OL.22.000034

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