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Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm

✍ Scribed by Bergmann, K.; Danylyuk, S. V.; Juschkin, L.

Book ID: 121681139
Publisher: American Institute of Physics
Year: 2009
Tongue: English
Weight: 475 KB
Volume: 106
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.3243287

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