Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography

✍ Scribed by White, J.; O’Sullivan, G.; Zakharov, S.; Choi, P.; Zakharov, V.; Nishimura, H.; Fujioka, S.; Nishihara, K.

• Book ID: 120946744
• Publisher: American Institute of Physics
• Year: 2008
• Tongue: English
• Weight: 624 KB
• Volume: 92
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.2906901