Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography

✍ Scribed by Stuik, R.; Louis, E.; Yakshin, A. E.; Görts, P. C.; Maas, E. L. G.; Bijkerk, F.; Schmitz, D.; Scholze, F.; Ulm, G.; Haidl, M.

• Book ID: 126220724
• Publisher: AVS (American Vacuum Society)
• Year: 1999
• Tongue: English
• Weight: 456 KB
• Volume: 17
• Category: Article
• ISSN: 0734-211X
• DOI: 10.1116/1.590942