๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Reduction of Chemical Reaction Mechanism for Halide-Assisted Silicon Carbide Epitaxial Film Deposition

โœ Scribed by Wang, Rong; Ma, Ronghui; Dudley, Michael


Book ID
126062677
Publisher
American Chemical Society
Year
2009
Tongue
English
Weight
850 KB
Volume
48
Category
Article
ISSN
0888-5885

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES