Tetrakis(trimethylsilyl)silane: Temperature dependence of vapor pressure, kinetics, and silicon carbide thin films by plasma-assisted liquid injection chemical vapor deposition process

✍ Scribed by J. Selvakumar; D. Sathiyamoorthy; K.S. Nagaraja

• Book ID: 113784174
• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 512 KB
• Volume: 129
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/j.matchemphys.2011.03.058