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Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases

✍ Scribed by Fatemeh Shariatmadar Tehrani, Boon Tong Goh…


Book ID
120681376
Publisher
Springer US
Year
2012
Tongue
English
Weight
717 KB
Volume
24
Category
Article
ISSN
0957-4522

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We report on the effects of deposition pressure P d on the growth and properties of the B-doped nanocrystalline silicon (nc-Si:H) thin films grown by hot-wire chemical vapor deposition (HWCVD) at very high hydrogen dilution of 98.8%. We found that the crystallinity of nc-Si:H or mc-Si:H films is not