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Redistribution of Er implanted into Si(1 0 0): Correlation with implantation induced damage

✍ Scribed by T.K Chini; D.P Datta; B Satpati; M Tanemura; F Okuyama

Book ID: 114167561
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 393 KB
Volume: 212
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(03)01499-x

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Redistribution of Er implanted into Si(1&#xa0;0&#xa0;0): Correlation with implantation induced damage

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