𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Recent studies of surface dynamic processes by reflection electron microscopy

✍ Scribed by Katsumichi Yagi; Akira Yamanaka; Itsuro Homma


Publisher
John Wiley and Sons
Year
1992
Tongue
English
Weight
898 KB
Volume
20
Category
Article
ISSN
1059-910X

No coin nor oath required. For personal study only.

✦ Synopsis


Reflection electron microscope studies of surface dynamic processes are reviewed and illustrated with recent new observations. They include: surface electromigration and current dependent structures of Si surfaces; surface etching by oxidation of Si surface; and growth of two dimensional alloyed adsorbate by co-deposition of metals on Si surface. The observations revealed details of the surface dynamic processes, which are difficult to obtain with other surface analysis techniques.


πŸ“œ SIMILAR VOLUMES


Reflected Electron Energy-loss Microscop
✍ Paparazzo, E. πŸ“‚ Article πŸ“… 1997 πŸ› John Wiley and Sons 🌐 English βš– 495 KB πŸ‘ 2 views

The diagnostic potential of reΓ‘ected electron energy-loss microscopy (REELM) and scanning Auger microscopy (SAM) are explored with respect to two particular aspects encountered in the surface microchemical analysis of semiconductor materials : determining the kind of coverage, i.e. whether continuou