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Reactive sputter deposition of alumina thin films using a hollow cathode sputtering source

✍ Scribed by Pradhan, Anshu A.; Shah, S. Ismat; Unruh, Karl M.

Book ID
121657137
Publisher
American Institute of Physics
Year
2002
Tongue
English
Weight
313 KB
Volume
73
Category
Article
ISSN
0034-6748

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper