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Reactive ion etching of glass for biochip applications: Composition effects and surface damages

✍ Scribed by Edouard Thiénot; Florian Domingo; Edmond Cambril; Charlie Gosse

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
265 KB
Volume
83
Category
Article
ISSN
0167-9317

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Implantations of Xe +, Ar + and N + ions at room temperature cause radiation damage, volume expansion and near-surface decomposition in LiNbO 3. Precipitates of Li20 are formed in surface regions when exposed to the atmosphere. Amorphization induced by heavy damage is observed in the ionimplanted re