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Effects of ion implantation on surface composition and enhanced etching in LiNbO3

✍ Scribed by Shao Tianhao; Jiang Xinyuan; Shang Wei; Feng Xiqi


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
392 KB
Volume
10
Category
Article
ISSN
0921-5107

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✦ Synopsis


Implantations of Xe +, Ar + and N + ions at room temperature cause radiation damage, volume expansion and near-surface decomposition in LiNbO 3. Precipitates of Li20 are formed in surface regions when exposed to the atmosphere. Amorphization induced by heavy damage is observed in the ionimplanted region, which enhances the etching rate of LiNbO~. These effects were investigated using Rutherford back-scattering and channelling, Auger electron spectroscopy and secondary ion mass spectroscopy measurements, and some mechanisms for their occurrence are proposed and discussed.


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High energy implantation of medium-light elements such as oxygen and carbon was performed in X-cut LiNbO 3 single crystals in order to prepare high quality optical waveguides. The compositional and damage profiles, obtained by exploiting the secondary ion mass spectrometry and Rutherford back-scatte