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Carbonaceous overlayer and near-surface damage after pure CF4 reactive ion beam etching of silicon: Exposure dose effects

✍ Scribed by C. Lejeune; J.P. Grandchamp; J.P. Gilles; E. Collard; P. Scheiblin


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
607 KB
Volume
36
Category
Article
ISSN
0169-4332

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