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Reactive ion etching characterization of a-SiC: H in CF4/O2 plasma

โœ Scribed by G. Saggio; E. Verona; P. Di Rosa; S. La Monica; R. Salotti; L. Schirone


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
392 KB
Volume
29
Category
Article
ISSN
0921-5107

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