𝔖 Bobbio Scriptorium
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A Review of SiC Reactive Ion Etching in Fluorinated Plasmas

✍ Scribed by P. H. Yih; V. Saxena; A. J. Steckl


Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
756 KB
Volume
202
Category
Article
ISSN
0370-1972

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