We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a
β¦ LIBER β¦
A review of reactive ion beam etching for production
β Scribed by P.J. Revell; G.F. Goldspink
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 902 KB
- Volume
- 34
- Category
- Article
- ISSN
- 0042-207X
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