We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a
β¦ LIBER β¦
Parametric investigations and simulations of ion beam etching and reactive ion etching mechanisms for GaAs compounds
β Scribed by K. Ketata; S. Koumetz; O. Latry; M. Ketata; R. Debrie
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 323 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0921-5107
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