Selective reactive ion etching of PECVD silicon nitride over amorphous silicon in CF4H2 and nitrogen containing CF4H2 plasma gas mixtures

✍ Scribed by M.Jagadesh Kumar; Savvas G. Chamberlain

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 415 KB
• Volume: 39
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(95)00109-7