✦ LIBER ✦
Removal processes for damage and contamination after CF4/40%H2 reactive ion etching of silicon : Awatar Singh. Microelectron. J.18(5), 13 (1987)
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 123 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0026-2714
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