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Quantitative evaluation of proximity effect in raster-scan exposure system for electron-beam lithography

✍ Scribed by Nakase, M.; Yoshimi, M.

Book ID: 114593483
Publisher: IEEE
Year: 1980
Tongue: English
Weight: 826 KB
Volume: 27
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1980.20057

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