Effect of time-dependent development process on the limit of proximity exposure compensation in electron beam lithography

✍ Scribed by P.R. Deshmukh; W.S. Khokle

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 496 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90295-i