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Effect of resist development process on the determination of proximity function in electron lithography

โœ Scribed by S.V. Babin; A.A. Svintsov

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
286 KB
Volume
17
Category
Article
ISSN
0167-9317

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## Synopsis .A new method of evaluation of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evaluation procedure using the unit parameters (film thickness and de