Characteristics of the resist development process in electron beam lithography : N. A. Madjarova. Microelectronics Journal23, 375 (1992)

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 113 KB
• Volume: 33
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(93)90239-u