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[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - High-speed proximity effect correction system for electron-beam projection lithography by cluster processing

✍ Scribed by Ogino, K.; Hoshino, H.; Machida, Y.; Osawa, M.; Arimoto, H.; Takahashi, K.; Yamashita, H.

Book ID: 118168514
Publisher: Japan Soc. Appl. Phys
Year: 2002
Tongue: Japanese
Weight: 139 KB
Volume: 0
Category: Article
ISBN-13: 9784891140311
DOI: 10.1109/imnc.2002.1178540

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