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[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - 3D proximity effect correction for multi-layer structures in EB lithography

✍ Scribed by Ogino, K.; Hoshino, H.; Machida, Y.; Osawa, M.; Arimoto, H.; Maruyama, T.; Kawamura, E.

Book ID: 118168515
Publisher: Japan Soc. of Appl. Phys
Year: 2003
Weight: 170 KB
Volume: 0
Category: Article
ISBN-13: 9784891140403
DOI: 10.1109/imnc.2003.1268625

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