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[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Fabrication of Fin-type double-gate MOSFET (FXMOS) structure by orientation-dependent etching and electron beam lithography

✍ Scribed by Liu, Y.X.; Ishii, K.; Tsutsumi, T.; Masahara, M.; Takashima, H.; Suzuki, E.

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