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Proxy — A new approach for proximity correction in electron beam lithography

✍ Scribed by V.V. Aristov; A.I. Erko; B.N. Gaifullin; A.A. Svintsov; S.I. Zaitsev; R.R. Jede; H.F. Raith


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
315 KB
Volume
17
Category
Article
ISSN
0167-9317

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