Properties of tantalum oxynitride thin films produced by magnetron sputtering: The influence of processing parameters

✍ Scribed by Cristea, D.; Constantin, D.; Crisan, A.; Abreu, C.S.; Gomes, J.R.; Barradas, N.P.; Alves, E.; Moura, C.; Vaz, F.; Cunha, L.

• Book ID: 122579184
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 531 KB
• Volume: 98
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/j.vacuum.2013.03.017