Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane

✍ Scribed by A Pêcheur; J.L Autran; J.P Lazarri; P Pinard

• Book ID: 117149543
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 209 KB
• Volume: 245
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(98)00868-0