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Properties of Si:H thin films deposited by rf-PECVD of silane–argon mixtures with variation of the plasma condition

✍ Scribed by Partha Pratim Ray; Namita Dutta Gupta; Partha Chaudhuri; D.L Williamson; S Vignoli; C Longeaud


Book ID
117145414
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
141 KB
Volume
299-302
Category
Article
ISSN
0022-3093

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