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Effect of rf power on the properties of ITO thin films deposited by plasma enhanced reactive thermal evaporation on unheated polymer substrates

โœ Scribed by C Nunes de Carvalho; A Luis; O Conde; E Fortunato; G Lavareda; A Amaral

Book ID
117145602
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
509 KB
Volume
299-302
Category
Article
ISSN
0022-3093

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## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 ยฐC in a vacuum process. It also provides good thickness controllability and uniformity of the depos