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Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

✍ Scribed by N.A. Morrison; C. William; B. Racine; W.I. Milne; E. Martinez; J. Esteve; J.L. Andujar

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 111 KB
Volume: 3
Category: Article
ISSN: 1567-1739
DOI: 10.1016/s1567-1739(03)00107-x

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