Films were produced by plasma enhanced chemical vapor deposition (PECVD) of tetramethylsilane (TMS) -helium-argon mixtures with either oxygen or nitrogen in a vacuum system fed with radiofrequency power. Actinometric optical emission spectroscopy was used to determine trends in the concentrations of
✦ LIBER ✦
Electronic properties of plasma-deposited films prepared from tetramethylsilane
✍ Scribed by J. Tyczkowski; E. Odrobina; P. Kazimierski; H. Bässler; A. Kisiel; N. Zema
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 714 KB
- Volume
- 209
- Category
- Article
- ISSN
- 0040-6090
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## Amorphous hydrogenated carbon films were prepared by plasma assisted CVD method. Their de conductivity was studied as a function of temperature in the range of 300 K to 10 K. films were then subjected to high energy (170 MeVI ion irradiation. After irradiation a marked change was observed in th