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Properties and dynamic behavior of electron traps in HfO2/SiO2 stacks

✍ Scribed by C.Z. Zhao; M.B. Zahid; J.F. Zhang; G. Groeseneken; R. Degraeve; S. De Gendt

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
164 KB
Volume
80
Category
Article
ISSN
0167-9317

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