Modeling of remote Coulomb scattering limited mobility in MOSFET with HfO2/SiO2 gate stacks

✍ Scribed by S. Barraud; L. Thevenod; M. Cassé; O. Bonno; M. Mouis

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 379 KB
• Volume: 84
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.04.032