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Properties and characteristics of Al-films deposited in do and rf magnetron systems

✍ Scribed by AR Nyaiesh; L Holland

Publisher: Elsevier Science
Year: 1982
Tongue: English
Weight: 267 KB
Volume: 32
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(82)94044-1

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