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Growth and properties of YAlO film synthesized by RF magnetron sputtering

✍ Scribed by Keiko Matsunouchi; Naoyoshi Komatsu; Chiharu Kimura; Hidemitsu Aoki; Takashi Sugino

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
478 KB
Volume
255
Category
Article
ISSN
0169-4332

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Characterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering
✍ N. Alba de SΓ‘nchez; C. RincΓ³n; G. Zambrano; P. Prieto πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 97 KB πŸ‘ 2 views

In this work a single Langmuir probe has been used to determine in-situ the plasma electronic temperature (T e ) and the electronic density (h e ) of an rf magnetron sputtering system used to grow CN x films. Sodium chloride substrates and a carbon target (99.999%) in a mixture of Ar/N 2 were used.