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Optical properties of metal and semiconductor SmS thin films fabricated by rf/dc dual magnetron sputtering

✍ Scribed by S. Tanemura; L. Miao; S. Koide; Y. Mori; P. Jin; A. Terai; N. Nabatova-Gabain


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
154 KB
Volume
238
Category
Article
ISSN
0169-4332

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The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos