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The microstructure and properties of titanium dioxide films synthesized by unbalanced magnetron sputtering

✍ Scribed by Y.X. Leng; J.Y. Chen; P. Yang; H. Sun; N. Huang

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
922 KB
Volume
257
Category
Article
ISSN
0168-583X

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The field emission properties of Ti-DLC films in diode and coplanar device structures were studied. An emission current density of 1.14 A/cm 2 could be obtained at an applied field of 33 V/mm and the threshold field was 24 V/mm for the coplanar emission structure. The silicon substrate was found to